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USA, Texas, Dallas, 75229-3198, 1801 Royal Ln, Suite 600
Director
Randy Gee - President
Phones of enterprise
management
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Wholesale trade - non-durable goods
In stock
EmerALD is a process module designed to deposit thin conformal metal layers by atomic layer deposition (ALD) for advanced CMOS gate stacks and other applications.
The EmerALD process module utilizes the sequential exposure of a heated wafer to gases, which once in the targeted process parameter...
Group: Production equipment
In stock
The Eagle family of single wafer PECVD and PEALD reactors has demonstrated superior production performance. The Eagle solutions feature high productivity and up-time, stable uniformity, small footprint, simple mechanism and low CoO. Eagle reactors are designed for optimum deposition of the Aurora®...
Group: Reactors
In stock
The Dragon family of reactors are 300mm HVM proven solutions specifically tailored for conventional PECVD applications.
• Simplified design enables shortened lead time for manufacturing and installation
• Low CoO performance
• Efficient energy consumption
• Effective capital investment
•...
Group: Reactors
In stock
Pulsar is a process module that deposits by atomic layer deposition (ALD) high-k dielectric materials required for advanced CMOS gate stack and other high-k applications. ASMs Microchemistry division introduced ALD processing to the industry and Pulsar is now in high volume production at advanced...
Group: Production equipment
In stock
The Advance Series is a comprehensive range of batch vertical furnaces optimized to meet the needs of advanced semiconductor applications. ASM innovations enable extending processing capabilities as well as reducing cost of ownership.
Advance vertical furnaces feature dual reactor configurations...
Group: Technological Equipment
In stock
Both ASM International's Front-end and Back-end product lines are positioned to serve the immediate and future needs of the semiconductor industry. ASM's tools are engineered for leading-edge processes.
Group: Industrial equipment
In stock
With most of the newly installed semiconductor device fabrication capacity employing 300mm wafers, our system and process development as well as our sales efforts are concentrated on 300mm equipment.
Group: Special equipment for producing
In stock
Today, we support high volume production systems at 90, 65 & 45 nanometers, and in close cooperation with our customers we are qualifying and testing new critical process equipment for line widths at or below 32nm. Simultaneously, we are developing new 22nm technologies in our laboratories.
Group: Special equipment for producing
In stock
The Epsilon single wafer epitaxy tool offers a wide range of epitaxy applications, ranging from high temperature silicon for wafer preparation, to low temperature, selective or non-selective silicon germanium (SiGe) for transistor strain layer formation. The Epsilon reactor utilizes integrated...
Group: Industrial equipment